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Iwamoto, Naoya*; Azarov, A.*; Oshima, Takeshi; Moe, A. M. M.*; Svensson, B. G.*
Journal of Applied Physics, 118(4), p.045705_1 - 045705_8, 2015/07
Times Cited Count:6 Percentile:27.03(Physics, Applied)Lohrmann, A.*; Iwamoto, Naoya*; Bodrog, Z.*; Castelletto, S.*; Oshima, Takeshi; Karle, T. J.*; Gali, A.*; Prawer, S.*; McCallum, J. C.*; Johnson, B. C.*
Nature Communications (Internet), 6, p.7783_1 - 7783_7, 2015/07
Times Cited Count:143 Percentile:96.84(Multidisciplinary Sciences)Son, N. T.*; Umeda, Takahide*; Isoya, Junichi*; Gali, A.*; Bockstedte, M.*; Magnusson, B.*; Ellison, A.*; Morishita, Norio; Oshima, Takeshi; Ito, Hisayoshi; et al.
Physica B; Condensed Matter, 376-377, p.334 - 337, 2006/04
Times Cited Count:3 Percentile:17.99(Physics, Condensed Matter)no abstracts in English
Matsuura, Hideharu*; Kagamihara, So*; Ito, Yuji*; Oshima, Takeshi; Ito, Hisayoshi
Physica B; Condensed Matter, 376-377, p.342 - 345, 2006/04
Times Cited Count:8 Percentile:38.44(Physics, Condensed Matter)no abstracts in English
Matsuura, Hideharu*; Kagamihara, So*; Ito, Yuji*; Oshima, Takeshi; Ito, Hisayoshi
Microelectronic Engineering, 83(1), p.17 - 19, 2006/01
Times Cited Count:3 Percentile:24.47(Engineering, Electrical & Electronic)no abstracts in English
Pensl, G.*; Ciobanu, F.*; Frank, T.*; Kirmse, D.*; Krieger, M.*; Reshanov, S.*; Schmid, F.*; Weidner, M.*; Oshima, Takeshi; Ito, Hisayoshi; et al.
Microelectronic Engineering, 83(1), p.146 - 149, 2006/01
Times Cited Count:15 Percentile:59.32(Engineering, Electrical & Electronic)no abstracts in English
Oshima, Takeshi; Sato, Takahiro; Oikawa, Masakazu*; Onoda, Shinobu; Hirao, Toshio; Ito, Hisayoshi
Materials Science Forum, 527-529, p.1347 - 1350, 2006/00
Charge induced in 6H-SiC pn diodes by oxygen ion microbeams was examined in an energy range between 6 and 18 MeV. To minimize the influence of damage, single ion hit Transient Ion Beam Induced Current (TIBIC) measurement system, in which the transient current induced by single ion incidence can be measured, was used in this study. The value of charge increases with increasing reverse applied bias, and the saturation of charge is observed when the depletion layer becomes longer than ion range. An increase of collected charge by the funneling effect (the generation of a transient electric filed) is observed in the case of the depletion layer shorter than ion range. The charge collection efficiency is estimated to be 100 % in the saturation region (the depletion layer longer than ion range). It strongly suggests that high quality particle detectors are fabricated using SiC.
Isoya, Junichi*; Katagiri, Masayuki*; Umeda, Takahide*; Son, N. T.*; Henry, A.*; Gali, A.*; Morishita, Norio; Oshima, Takeshi; Ito, Hisayoshi; Janzn, E.*
Materials Science Forum, 527-529, p.593 - 596, 2006/00
no abstracts in English
Oshima, Takeshi; Sato, Takahiro; Oikawa, Masakazu*; Yamakawa, Takeshi; Onoda, Shinobu; Wakasa, Takeshi; Laird, J. S.; Hirao, Toshio; Kamiya, Tomihiro; Ito, Hisayoshi; et al.
Nuclear Instruments and Methods in Physics Research A, 541(1-2), p.236 - 240, 2005/04
Times Cited Count:9 Percentile:55.97(Instruments & Instrumentation)In order to develop particle detectors based on SiC semiconductor, SiC pn-diodes were irradiated with microbeam of 15MeV oxygen ions. The transient current was measured using the single ion hit transient ion beam induced current (TIBIC) system at TIARA. As the results, peak intensity of transient current induded by ion irradiation increased and falltime decreased with increasing applied bias. By the integration of transient current, the charge collection was estimated. It was found that charges generated in deeper region beyond the depletion layer can be collected by the funneling effect.
Oshima, Takeshi
Hoshasen To Sangyo, (105), p.12 - 18, 2005/03
no abstracts in English
Weidner, M.*; Pensl, G.*; Nagasawa, Hiroyuki*; Schner, A.*; Oshima, Takeshi
Materials Science Forum, 457-460, p.485 - 488, 2004/10
no abstracts in English
Oshima, Takeshi; Ito, Hisayoshi
Proceedings of the 6th International Workshop on Radiation Effects on Semiconductor Devices for Space Application (RASEDA-6), p.191 - 194, 2004/10
no abstracts in English
Oshima, Takeshi; Lee, K. K.; Onoda, Shinobu*; Kamiya, Tomihiro; Oikawa, Masakazu*; Laird, J. S.; Hirao, Toshio; Ito, Hisayoshi
Nuclear Instruments and Methods in Physics Research B, 210, p.201 - 205, 2003/09
Times Cited Count:4 Percentile:33.69(Instruments & Instrumentation)Electrodes on SiC pn diode were studied uising Transient Ion Beam Induced Current system (TIBIC). pn junction of SiC diode was formed by phosphorus ion implantation at 800 C and subsequent annealing at 1800 C for 1 min in Ar. Electrodes of diode were fabricated (1) Al evaporation and sintering at 850 C or (2) one more Al evaporation after the process mentioned above. TIBIC measurement using 15 MeV-O and 12 MeV-Ni ion micro beam. As the result, non-uniformity for transient current from the electrodes of diode (1)was observed. As for diode (2), such non-uniformity was not observed. On the other hand, the value of collected charges was the same for both diodes. This indicates that the quality of pn junction is the almost same for both diodes. For current-voltage characteristics, both diodes showed a order of pA at reverse bias of 30 V and turn-on at forward bias of 2V which are ideal for SiC diode. Thus, we can conclude that we obtain the information on electrical characteristics of electrodes which is not obtained from normal current-voltage measurement.
Redmann, F.*; Kawasuso, Atsuo; Petters, K.*; Krause-Rehberg, R.*; Ito, Hisayoshi
Materials Science Forum, 363-365, p.126 - 128, 2001/05
no abstracts in English
Kawasuso, Atsuo; Redmann, F.*; Krause-Rehberg, R.*; Yoshikawa, Masahito; Kojima, Kazutoshi; Ito, Hisayoshi
Physica Status Solidi (B), 223(2), p.R8 - R10, 2001/01
no abstracts in English
Kawasuso, Atsuo; Redmann, F.*; Krause-Rehberg, R.*; Sperr, P.*; Frank, T.*; Weidner, M.*; Pensl, G.*; Ito, Hisayoshi
Materials Science Forum, 353-356, p.537 - 540, 2001/00
no abstracts in English
Frank, T.*; Weidner, M.*; Ito, Hisayoshi; Pensl, G.*
Materials Science Forum, 353-356, p.439 - 442, 2001/00
no abstracts in English
Ito, Hisayoshi; Oshima, Takeshi
Hyomen Kagaku, 21(12), p.778 - 783, 2000/12
no abstracts in English
Idesaki, Akira*; Narisawa, Masaki*; *; Sugimoto, Masaki; Seguchi, Tadao; Ito, Masayoshi*
Key Engineering Materials, 159-160, p.107 - 111, 1999/00
no abstracts in English
Nakano, Junichi; Yamada, Reiji
Proc. of 2nd IEA/JUPITER Joint Int. Workshop on SiC/SiC Ceramic Composites for Fusion Applications, p.64 - 67, 1997/00
no abstracts in English